WebThe flatness of the chuck on the stepper or scanner is critical to obtain good patterning performance especially in the sub quarter micron regime. In this study an attempt has … WebFlatness – The flatness of the wafer chuck is an important specification and is usually specified in microns. For extreme UV photolithography a wafer chuck with high flatness …

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WebOct 1, 2007 · Understanding and characterizing the clamping ability of the electrostatic chuck and its effect on the mask flatness is a critical issue. In the present study, chucking experiments were performed ... WebThe PSFM reticle allows rapid characterization of several types of focus errors, to evaluate the effects of the stepper lens, autofocus and auto-leveling subsystems and wafer chuck flatness, The PSFM reticle has also been used to identify process-induced focus errors. PSFM Applications Measure focus, tilt, curvature, astigmatism, and IFD fixed line of parabola

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WebA deformable vacuum pin chuck includes a thin silicon chuck for supporting a semiconductor wafer during lithographic processing and a number of piezoelectric transducers for selectively deforming the chuck. Chuck deformation caused by application of electric potentials to selected transducers may be used to correct flatness deviations … WebChuck Flatness +/-13μm Chuck Breakdown Voltage At least 500V Chuck Isolation At least 1GΩ Chuck Adjustment 360° coarse, +/-6° fine Microscope High quality stereo zoom with up to 200mm working distance and magnification ranging from 3.5X to 180X Feedthrough Terminals BNC, Triax or Banana plug System Dimensions 101cm wide x91cm deep x … fixed limited